发明名称 SUBSTRATE WITH TRANSPARENT ELECTRODE AND PRODUCTION METHOD THEREOF
摘要 PROBLEM TO BE SOLVED: To provide a substrate with a transparent electrode which accelerates crystallization by a heat treatment, suppresses crystallization at ordinary temperature and achieves high light transmittance at the same time.SOLUTION: In a substrate with a transparent electrode, a ground layer 200 and a transparent electrode thin film 300 are formed, in order, on a transparent film substrate 100, and the ground layer 200 is based on zinc oxide, has a film thickness of 0.5-8 nm and contains 1-4 wt.% of silicon oxide. The transparent electrode thin film 300 functions as a conductive layer, and the ground layer 200 is film-formed by sputtering so as to be high in resistivity.SELECTED DRAWING: Figure 1
申请公布号 JP2016031809(A) 申请公布日期 2016.03.07
申请号 JP20140153056 申请日期 2014.07.28
申请人 KANEKA CORP 发明人 IRIE NOBORU;KUSHIZAKI TAKAYOSHI;KUCHIYAMA TAKASHI
分类号 H01B5/14;B32B7/02;B32B9/00;C23C14/08;G06F3/041;H01B13/00 主分类号 H01B5/14
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