| 摘要 |
The present invention relates to a salt, a resin, a resist composition, and a producing method of a resist pattern. The salt is represented by chemical formula (i). In the chemical formula (i), Q^1 and Q^2 each independently represent a fluorine atom or a C_1 to C_6 perfluoroalkyl group; and L^b1 represents a single bond or a divalent C_1 to C_24 saturated hydrocarbon group, wherein a methylene group can be substituted by an oxygen atom or a carbonyl group, a hydrogen atom can be substituted by a hydroxyl group or a fluorine atom; Y represents a hydrogen atom, a fluorine atom, or an optionally substituted C_3 to C_18 alicyclic hydrocarbon group, wherein a methylene group can be substituted by an oxygen atom, a carbonyl group or a sulfonyl group; Ar represents a divalent C_6 to C_20 aromatic hydrocarbon group; and Z^+ represents an organic sulfonium cation or an organic iodonium cation. |
