| 摘要 |
The present invention relates to a substrate treating apparatus. The substrate treating apparatus according to an embodiment of the present invention comprises a support unit supporting a substrate; a head unit comprising one or multiple heads spraying a treating agent to the substrate supported on the support unit; a gantry coupled with the heads, and moved from the upper side of the support unit; a treating agent feeding unit storing the treating agent fed to the heads; and a heating unit corresponding to the support unit on the upper side of the substrate supported on the support unit, and leveling the treating agent by heating the substrate receiving the treating agent. The present invention has a purpose of providing a substrate treating apparatus and a substrate treating method transferring a substrate regardless of an external force in a substrate transferring process. |
