| 摘要 |
The present invention relates to a method to manufacture high-purity ITO target powder using low-purity indium metal and tin metal and, more specifically, relates to a method to manufacture high-purity ITO target powder with 99.995% (4N5) or more; and to manufacture environmentally friendly and economical high-purity ITO target powder with a simple process and at low costs when compared with a conventional method using indium metal and tin metal with low purity (98-99%) which does not pass through electrolytic refining as initial powder. The method comprises: an acid dissolving step of dissolving granule-type indium metal and tin metal with inorganic acid; a concentration adjustment step of inputting ultrapure water to an acid dissolving liquid generated in the acid dissolving step to adjust the concentration of the acid dissolving liquid; a precipitation step of inputting a precipitant to the acid dissolving liquid passing through the concentration adjustment step to precipitate metal hydroxide in a pH range of 4-9; a crystallization step of inputting an organic acid of 1.0-3.0 M to the acid dissolving liquid passing through the precipitation step to crystallize the metal hydroxide into metal organic acid salt; a filtration and washing step of filtrating, washing, and drying the metal organic acid salt generated through the crystallization step; and a firing step of heating and oxidizing the metal organic acid salt recovered through the filtration and washing step. |
