发明名称 NITRIDE SEMICONDUCTOR DEVICE
摘要 A nitride semiconductor device includes a transistor having a semiconductor stacked body formed on a substrate, and a pn light-emitting body formed on the semiconductor stacked body. The semiconductor stacked body includes a first nitride semiconductor layer, and a second nitride semiconductor layer formed on the first nitride semiconductor layer and having a bandgap wider than that of the first nitride semiconductor layer. The transistor includes: the semiconductor stacked body; a source electrode and a drain electrode formed away from each other on the semiconductor stacked body; and a gate electrode provided between the source electrode and the drain electrode and formed away from the source electrode and the drain electrode. The pn light-emitting body includes a p-type nitride semiconductor layer and an n-type nitride semiconductor layer to emit a light beam having an energy value higher than an electron trapping level existing in the semiconductor stacked body, in which the p-type nitride semiconductor layer of the pn light-emitting body is electrically connected to the gate electrode, and functions as a gate of the transistor.
申请公布号 US2016064600(A1) 申请公布日期 2016.03.03
申请号 US201514934244 申请日期 2015.11.06
申请人 Panasonic Intellectual Property Management Co., Ltd. 发明人 KURODA MASAYUKI;YANAGIHARA MANABU;OKI SHINICHI
分类号 H01L33/06;H01L33/00;H01L33/18;H01L33/32 主分类号 H01L33/06
代理机构 代理人
主权项 1. A nitride semiconductor device comprising: a transistor having: a semiconductor stacked body formed on a substrate, and including a first nitride semiconductor layer, and a second nitride semiconductor layer formed on the first nitride semiconductor layer and having a bandgap wider than that of the first nitride semiconductor layer; a source electrode and a drain electrode formed away from each other on the semiconductor stacked body; and a gate electrode provided between the source electrode and the drain electrode and formed away from the source electrode and the drain electrode; and a pn light-emitting body formed on the semiconductor stacked body, and including a p-type nitride semiconductor layer and an n-type nitride semiconductor layer to emit a light beam having an energy value higher than an electron trapping level existing in the semiconductor stacked body, wherein the p-type nitride semiconductor layer of the pn light-emitting body is electrically connected to the gate electrode, and functions as a gate of the transistor.
地址 Osaka JP