发明名称 POLISHING PAD
摘要 Provided is a polishing pad capable of removing waviness on a resin-coated surface of an object to be polished having a curved surface. This polishing pad (10) is provided with a structure (40, 50) which has a polishing surface (30) made of a hard resin layer (40) and allows the polishing surface (30) to conform to the curved surface of the object to be polished (90).
申请公布号 WO2016031143(A1) 申请公布日期 2016.03.03
申请号 WO2015JP03854 申请日期 2015.07.30
申请人 FUJIMI INCORPORATED 发明人 KATAYAMA, KOJI;OHASHI, KEIGO;YAMADA, EIICHI;MORINAGA, HITOSHI
分类号 B24B37/22;B24B37/26 主分类号 B24B37/22
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