发明名称 Selective Deposition With Alcohol Selective Reduction And Protection
摘要 Methods of selectively depositing a metal selectively onto a metal surface relative to a dielectric surface. Methods include reducing a metal oxide surface to a metal surface and protecting a dielectric surface to minimize deposition thereon.
申请公布号 US2016064275(A1) 申请公布日期 2016.03.03
申请号 US201414469980 申请日期 2014.08.27
申请人 Applied Materials, Inc. 发明人 Liu Feng Q.;Ma Paul F.;Ai Hua;Lu Jiang;Chang Mei;Thompson David
分类号 H01L21/768;H01L21/311 主分类号 H01L21/768
代理机构 代理人
主权项 1. A method of depositing a film, the method comprising: providing a substrate comprising a first substrate surface including a metal oxide and a second substrate surface including a hydroxyl-terminated dielectric surface; exposing the substrate to an alcohol to reduce the metal oxide to a first metal and esterify the hydroxyl-terminated surface to form an alkoxy-terminated dielectric surface; exposing the substrate to one or more deposition gases to deposit a second metal film on the first metal selectively over the alkoxy-terminated dielectric surface; and hydroxylating the alkoxy-terminated dielectric surface to form a hydroxyl-terminated dielectric.
地址 Santa Clara CA US