发明名称 |
Selective Deposition With Alcohol Selective Reduction And Protection |
摘要 |
Methods of selectively depositing a metal selectively onto a metal surface relative to a dielectric surface. Methods include reducing a metal oxide surface to a metal surface and protecting a dielectric surface to minimize deposition thereon. |
申请公布号 |
US2016064275(A1) |
申请公布日期 |
2016.03.03 |
申请号 |
US201414469980 |
申请日期 |
2014.08.27 |
申请人 |
Applied Materials, Inc. |
发明人 |
Liu Feng Q.;Ma Paul F.;Ai Hua;Lu Jiang;Chang Mei;Thompson David |
分类号 |
H01L21/768;H01L21/311 |
主分类号 |
H01L21/768 |
代理机构 |
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代理人 |
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主权项 |
1. A method of depositing a film, the method comprising:
providing a substrate comprising a first substrate surface including a metal oxide and a second substrate surface including a hydroxyl-terminated dielectric surface; exposing the substrate to an alcohol to reduce the metal oxide to a first metal and esterify the hydroxyl-terminated surface to form an alkoxy-terminated dielectric surface; exposing the substrate to one or more deposition gases to deposit a second metal film on the first metal selectively over the alkoxy-terminated dielectric surface; and hydroxylating the alkoxy-terminated dielectric surface to form a hydroxyl-terminated dielectric. |
地址 |
Santa Clara CA US |