ETCHING MASK, MANUFACTURING METHOD THEREFOR, POROUS MEMBRANE MANUFACTURING METHOD USING ETCHING MASK, POROUS MEMBRANE, FINE DUST-BLOCKING MASK INCLUDING POROUS MEMBRANE, AND MANUFACTURING METHOD FOR SURFACE ENHANCED RAMAN SCATTERING ACTIVE SUBSTRATE

摘要

According to the present invention, in an etching mask, a manufacturing method therefor, a porous membrane manufacturing method, the porous membrane, a fine dust-blocking mask, and a surface enhanced Raman scattering active substrate manufacturing method, the etching mask comprises: an organic film; and a pattern layer arranged on the organic film and having openings formed in the shape of a micro hole or a nano hole and having a uniform size.