| 发明名称 |
COMPOSITION AND METHOD FOR POLISHING A SAPPHIRE SURFACE |
| 摘要 |
An improved composition and method for polishing a sapphire surface is disclosed. The method comprises abrading a sapphire surface, such as a C-plane, R-plane or A-plane surface of a sapphire wafer, with a polishing composition comprising colloidal silica suspended in an aqueous medium, the polishing composition having an acidic pH and including a sapphire removal rate-enhancing amount of phosphoric acid. |
| 申请公布号 |
US2016060487(A1) |
申请公布日期 |
2016.03.03 |
| 申请号 |
US201514838460 |
申请日期 |
2015.08.28 |
| 申请人 |
Cabot Microelectronics Corporation |
发明人 |
KRAFT Steven |
| 分类号 |
C09G1/02 |
主分类号 |
C09G1/02 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A method of polishing a sapphire surface comprising abrading the sapphire surface with a polishing composition comprising colloidal silica at about 0.5 to about 20 percent by weight of the polishing composition suspended in an aqueous medium, the polishing composition having an acidic pH and including a sapphire removal rate-enhancing amount of phosphoric acid of about 0.0001 to about 1.0 percent by weight of the polishing composition. |
| 地址 |
Aurora IL US |
