| 摘要 |
[Problem] To provide an electrode substrate film in which a circuit pattern comprising a thin metallic line is hardly visible even under high-intensity illumination, and a laminate film that is used in the electrode substrate film. [Solution] An electrode substrate film having a transparent substrate 52 and a laminated thin line made of metal, characterized in that: the laminated thin line is 20 μｍ or less in line width and has a first metal absorption layer 51 having a line thickness of 20-30 nm and a second metal layer 50, as counted from the transparent substrate side; and the optical constants of the metal absorption layer in a visible wavelength region (400-780 nm) are such that the refractive index and the extinction coefficient at a wavelength of 400 nm are 2.0-2.2 and 1.8-2.1, respectively, the refractive index and the extinction coefficient at a wavelength of 500 nm are 2.4-2.7 and 1.9-2.3, respectively, the refractive index and the extinction coefficient at a wavelength of 600 nm are 2.8-3.2 and 1.9-2.5, respectively, the refractive index and the extinction coefficient at a wavelength of 700 nm are 3.2-3.6 and 1.7-2.5, respectively, the refractive index and extinction coefficient at a wavelength of 780 nm are 3.5-3.8 and 1.5-2.4, respectively, the average reflectance in the visible wavelength region due to the interface reflection between the transparent substrate and metal absorption layer is 20% or less, and the difference between the maximum transmittance and the minimum transmittance in the visible wavelength region is 10% or less. |
