VACUUM DEPOSITION APPARATUS AND METHOD OF OPERATING THEREOF

摘要

A vacuum deposition apparatus is described. The vacuum deposition apparatus includes a vacuum chamber configured for material deposition within the vacuum chamber, a cathode having a target including deposition material, wherein the cathode is provided in the vacuum chamber, and at least one anode within the vacuum chamber, wherein the at least one anode includes a first structure having a conductive surface being shielded from deposits of materials coming from the target, and wherein the conductive surface is configured to collect electrons of the plasma.