REFRACTORY OBJECT, GLASS OVERFLOW FORMING BLOCK, AND PROCESS OF FORMING AND USING THE REFRACTORY OBJECT

摘要

A refractory object can include at least 10 wt % Al2O3. Further, the refractory object may contain less than approximately 6 wt % SiO2 or may include a dopant that includes an oxide of Ti, Mg, Ta, Nb, or any combination thereof. In an embodiment, at least approximately 1% of the Al2O3 in the refractory object can be provided as reactive Al2O3. In another embodiment, the refractory object may have a density of at least approximately 3.55 g/cc, a corrosion rate of no greater than approximately 2.69 mm/year, or any combination of the foregoing. In a particular embodiment, the refractory object can be used to form an Al—Si—Mg glass sheet. In an embodiment, the refractory object may be formed by a process using a compound of Ti, Mg, Ta, Nb, or any combination thereof.

主权项

1. A refractory object used in forming a glass object, the refractory object comprising:
at least 85 wt % Al2O3; less than 6 wt % of SiO2; less than 1.5 wt % TiO2; a dopant including an oxide of Mg, Ta, Nb, or any combination thereof; and a corrosion rate no greater than 2.69 mm/year.