APPARATUS FOR SUPPLYING PRECURSORS FOR FORMING THIN FILM AND FILM FORMING APPARATUS HAVING THE SAME

摘要

The present invention relates to a precursor supply device for forming a thin film, a thin film forming device with the precursor supply device, and a thin film forming method using the same. A precursor supply device according to an embodiment of the present invention includes: a raw material storing unit storing a liquid raw material; a droplet supply unit joined to the raw material storing unit and discharging the liquid raw material; a chamber wall limiting an evaporation space; a droplet inlet formed in a first lateral unit of the chamber wall and through which the droplets pass from the droplet supply unit to the evaporation space; a heating unit joined to the evaporation space and forming a gaseous precursor inside the evaporation space by evaporating the droplets inside the evaporation space; a transfer gas inlet formed in a second lateral unit of the chamber wall to input a transfer gas to the inside of the evaporation space; and a precursor evaporating unit formed in a third lateral unit of the chamber wall and including a precursor outlet discharging the gaseous precursor mixed with the transfer gas to a reaction chamber. The purpose of the present invention is to provide the precursor supply device capable of minimizing the waste of the raw material for easily and economically forming the thin film and forming the thin film with uniform properties on an object to be treated with various areas and various shapes.