PRESSURE CONTROL DEVICE, SURFACE MOUNT MACHINE AND PRESSURE CONTROL METHOD

摘要

The pressure of a gas supplied to a nozzle is stably controlled over a wide range. A first positive pressure supply pathway supplies the gas at a first positive pressure. A second positive pressure supply pathway supplies the gas at a second positive pressure that is lower than the first positive pressure. A nozzle connecting pathway is connected to the nozzle. A switch-over valve selectively switches between a first connected state in which the first positive pressure supply pathway is connected to the nozzle connecting pathway and a second connected state in which the second positive pressure supply pathway is connected to the nozzle connecting pathway. A valve controller controls the connected state of the switch-over valve and adjusts the pressure of the gas supplied to the nozzle within the range from the first positive pressure to the second positive pressure.

主权项

1. A pressure control device controls a pressure of a gas supplied to a nozzle in a processing machine that performs predetermined processing upon a member-to-be-processed while ejecting the gas from the nozzle toward the member-to-be-processed, comprising:
a first positive pressure supply pathway to supply the gas at a first positive pressure; a second positive pressure supply pathway to supply the gas at a second positive pressure that is lower than the first positive pressure; a nozzle connecting pathway that is connected to the nozzle; a switch-over valve that selectively switches between a first connected state in which the first positive pressure supply pathway is connected to the nozzle connecting pathway and a second connected state in which the second positive pressure supply pathway is connected to the nozzle connecting pathway; and a valve controller that controls the connected state of the switch-over valve and adjusts the pressure of the gas supplied to the nozzle within the range from the first positive pressure to the second positive pressure.