发明名称 METHOD OF FORMING A MAGNETIC DOMAIN WALL IN A NANOWIRE
摘要 A method of forming a domain wall in a nanowire, the method comprising the steps of: a) providing a conductive strip orthogonally to a nanowire adjacent a free end of the nanowire, the nanowire having an original magnetization direction; b) pulsing a current through the conductive strip to generate an Oersted field having a direction opposite to the original magnetization direction such that magnetization direction of a portion of the nanowire transversed by the conductive strip becomes opposite to the original magnetization direction, the domain wall being generated in the nanowire at a location defined between the portion of the nanowire transversed by the conductive strip and a second end of the nanowire, wherein no external magnetic field is provided during formation of the domain wall.
申请公布号 US2016064060(A1) 申请公布日期 2016.03.03
申请号 US201514843918 申请日期 2015.09.02
申请人 Nanyang Technological University 发明人 GUITE Chinkhanlun;KERK Inn Seng;MURAPAKA Chandra Sekhar;LEW Wen Siang
分类号 G11C11/16 主分类号 G11C11/16
代理机构 代理人
主权项 1. A method of forming a domain wall in a nanowire, the method comprising the steps of: a) providing a conductive strip orthogonally to a nanowire adjacent a free end of the nanowire, the nanowire having an original magnetization direction; b) pulsing a current through the conductive strip to generate an Oersted field having a direction opposite to the original magnetization direction such that magnetization direction of a portion of the nanowire transversed by the conductive strip becomes opposite to the original magnetization direction, the domain wall being generated in the nanowire at a location defined between the portion of the nanowire transversed by the conductive strip and a second end of the nanowire, wherein no external magnetic field is provided during formation of the domain wall.
地址 Singapore SG