| 发明名称 |
POLISHING PAD PRODUCTION METHOD |
| 摘要 |
The present invention is directed to a method for producing a polishing pad having a polishing layer comprising a sheet of a flexible polyurethane resin foam, the flexible polyurethane resin foam having an Asker D hardness of 30 or less at 25° C., and the method comprising: step A of cooling a block comprising the flexible polyurethane resin foam to be adjusted into an Asker D hardness of 35 or more; and step B of slicing the block, the Asker D hardness of which has been adjusted by the cooling, into a predetermined thickness to yield the sheet of the flexible polyurethane resin foam. The method for producing a polishing pad of the present invention makes it possible to slice, with a good precision, a block comprising a flexible polyurethane resin foam. |
| 申请公布号 |
US2016059378(A1) |
申请公布日期 |
2016.03.03 |
| 申请号 |
US201414782306 |
申请日期 |
2014.02.24 |
| 申请人 |
TOYO TIRE & RUBBER CO., LTD. |
发明人 |
KIMURA Tsuyoshi |
| 分类号 |
B24B37/24;C08J9/00 |
主分类号 |
B24B37/24 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A method for producing a polishing pad having a polishing layer comprising a sheet of a flexible polyurethane resin foam,
the flexible polyurethane resin foam having an Asker D hardness of 30 or less at 25° C., and the method comprising: step A of cooling a block comprising the flexible polyurethane resin foam to be adjusted into an Asker D hardness of 35 or more, and step B of slicing the block, the Asker D hardness of which has been adjusted by the cooling, into a predetermined thickness to yield the sheet of the flexible polyurethane resin foam. |
| 地址 |
Osaka JP |
