发明名称 MULTI-LASER SYSTEM AND METHOD FOR CUTTING AND POST-CUT PROCESSING HARD DIELECTRIC MATERIALS
摘要 Laser processing of hard dielectric materials may include cutting a part from a hard dielectric material using a continuous wave laser operating in a quasi-continuous wave (QCW) mode to emit consecutive laser light pulses in a wavelength range of about 1060 nm to 1070 nm. Cutting using a QCW laser may be performed with a lower duty cycle (e.g., between about 1% and 15%) and in an inert gas atmosphere such as nitrogen, argon or helium. Laser processing of hard dielectric materials may further include post-cut processing the cut edges of the part cut from the dielectric material, for example, by beveling and/or polishing the edges to reduce edge defects. The post-cut processing may be performed using a laser beam with different laser parameters than the beam used for cutting, for example, by using a shorter wavelength (e.g., 193 nm excimer laser) and/or a shorter pulse width (e.g., picosecond laser).
申请公布号 US2016059349(A1) 申请公布日期 2016.03.03
申请号 US201514838809 申请日期 2015.08.28
申请人 IPG Photonics Corporation 发明人 SERCEL Jeffrey P.;MENDES Marco;SARRAFI Rouzbeh;SCHOENLY Joshua;SONG Xiangyang;HANNON Mathew;SOKOL Miroslaw
分类号 B23K26/06;B23K26/361;C03B33/10;B23K26/14;C03B33/023;B23K26/38;B23K26/402 主分类号 B23K26/06
代理机构 代理人
主权项 1. A method for laser cutting and post-cut processing a part from a hard dielectric material, the method comprising: cutting at least one part from a hard dielectric material using at least a first laser beam, wherein the first laser beam is emitted from a continuous wave laser operating in a quasi-continuous wave (“QCW”) mode so as to emit consecutive pulses of laser light at a wavelength ranging between about 1060 nm and about 1070 nm; and post-cut processing cut edges of the at least one part using at least a second laser beam to bevel and/or polish the cut edges of the at least one part such that edge defects are reduced.
地址 Oxford MA US