| 发明名称 |
METHOD FOR FABRICATING AT LEAST ONE APERTURE WITH SHAPED SIDEWALLS IN A LAYER OF A LIGHT SENSITIVE PHOTOPOLYMER |
| 摘要 |
A method for fabricating at least one aperture (60, 64) with shaped sidewalls in a layer (52) of a light sensitive photopolymer (54), which method comprises:
(i) providing the layer (52) of the photopolymer (54);(ii) providing a mask (56);(iii) exposing the photopolymer (54) to light (58);(iv) utilising the mask (56) to control the intensity of the light (58) falling on the photopolymer (54); and(v) forming the mask (56) such that its control of the intensity of the light (58) falling on the photopolymer (54) causes the aperture (60, 64) to have the shaped sidewalls. |
| 申请公布号 |
US2016062239(A1) |
申请公布日期 |
2016.03.03 |
| 申请号 |
US201514713551 |
申请日期 |
2015.05.15 |
| 申请人 |
University of Southampton |
发明人 |
Morgan Hywel;Kalsi Sumit;de Planque Maurits;Kiang Kian Shen |
| 分类号 |
G03F7/20;G03F7/16 |
主分类号 |
G03F7/20 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A method for fabricating at least one aperture with shaped sidewalls in a layer of a light sensitive photopolymer, which method comprises:
(i) providing the layer of the photopolymer; (ii) providing a mask; (i) exposing the photopolymer to light; (iv) utilising the mask to control the intensity of the light falling on the photopolymer; and (v) forming the mask such that its control of the intensity of the light falling on the photopolymer causes the aperture to have the shaped sidewalls. |
| 地址 |
Southampton GB |
