发明名称 |
ARRAY SUBSTRATE AND METHOD FOR FABRICATING ARRAY SUBSTRATE, AND DISPLAY DEVICE |
摘要 |
The present invention discloses an array substrate, a method for fabricating an array substrate, and a display device, the array substrate includes: a base substrate; a TFT, a gate line, a data line and a pixel electrode formed on the base substrate, the TFT includes: a bottom gate, a first gate insulating layer, an active layer, a second gate insulating layer, a top gate, a gate isolation layer and a source electrode and a drain electrode sequentially formed on the base substrate; wherein, the source electrode and the drain electrode are in contact with the active layer through a first via hole and a second via hole passing through the gate isolation layer and the second insulating layer, respectively; the pixel electrode is in contact with the drain electrode. |
申请公布号 |
US2016064418(A1) |
申请公布日期 |
2016.03.03 |
申请号 |
US201514934864 |
申请日期 |
2015.11.06 |
申请人 |
BOE Technology Group Co., Ltd. |
发明人 |
Shi Lei |
分类号 |
H01L27/12;H01L29/66 |
主分类号 |
H01L27/12 |
代理机构 |
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代理人 |
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主权项 |
1. A method for fabricating an array substrate, including steps:
S1: sequentially forming a bottom gate, a first gate insulating layer, an active layer and a second gate insulating layer on a base substrate, wherein a gate line is formed at the same time as forming the bottom gate; S2: forming a top gate on the second gate insulating layer; S3: sequentially forming a gate isolation layer, a source electrode, a drain electrode and a pixel electrode on the top gate. |
地址 |
Beijing CN |