发明名称 |
METHOD OF DESIGNING LAYOUT OF INTEGRATED CIRCUIT AND METHOD OF MANUFACTURING THE INTEGRATED CIRCUIT |
摘要 |
A method of designing a layout of an integrated chip (IC) includes designing a first layout by place and route a plurality of standard cells that define the IC, and generating a second layout by modifying the first layout during a mask data preparation process related to the first layout, wherein the second layout is generated by connecting first and second patterns from among first layer patterns that correspond to a first layer of the first layout, such that the number of masks necessary for forming the first layer patterns is reduced. |
申请公布号 |
KR20160023542(A) |
申请公布日期 |
2016.03.03 |
申请号 |
KR20150030551 |
申请日期 |
2015.03.04 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
BAEK, SANG HOON;SONG, TAE JOONG;OH, SANG KYU;LEE, SEUNG YOUNG |
分类号 |
H01L27/02;H01L29/06 |
主分类号 |
H01L27/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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