| 摘要 |
PROBLEM TO BE SOLVED: To provide a photosensitive resin composition for etching resist which is excellent etching resistance and peelability after etching and can form a desired pattern; a wiring pattern formed using the same; and a touch panel.SOLUTION: A photosensitive resin composition for etching resist contains: (A) an alkali-soluble resin obtained by reacting a reaction product of an epoxy compound having two glydicyl ether groups derived from bisphenols with an unsaturated group-containing monocarboxylic acid with (a) dicarboxylic acid or tricarboxylic acid or an acid anhydride thereof and (b) a tetracarboxylic acid or acid dianhydride thereof; (B) a photopolymerizable monomer having at least one ethylenically unsaturated bond; (C) a compound having at least two epoxy groups in one molecule; (D) a photopolymerization initiator; and (E) a coloring material, with a predetermined amount. A wiring pattern is formed using the same. A touch panel includes the wiring pattern as a component.SELECTED DRAWING: None |
