PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

摘要

A plasma processing apparatus that performs plasma processing to a substrate held on a transport carrier including a frame and a holding sheet that covers an opening of the frame includes: a transport mechanism that transports the transport carrier; a position measuring section that measures a position of the substrate to the frame; a plasma processing section that includes a plasma processing stage on which the transport carrier is loaded and a cover that covers the frame and a part of the holding sheet loaded on the plasma processing stage, and has a window section for exposing a part of the substrate; and a control section that controls the transport mechanism such that the transport carrier is loaded on the plasma processing stage to satisfy a positional relationship between the window section and the substrate based on the position information of the substrate to the frame.

主权项

1. A plasma processing apparatus that performs plasma processing to a substrate held on a transport carrier, the transport carrier including a frame and a holding sheet that covers an opening of the frame, the substrate being held on the holding sheet, the plasma processing apparatus comprising;
a transport mechanism that transports the transport carrier holding the substrate; a position measuring section that measures a position of the substrate with respect to the frame; a plasma processing section that includes
a plasma processing stage on which the transport carrier holding the substrate is loaded anda cover that covers the frame and at least a part of the holding sheet loaded on the plasma processing stage, and has a window section for exposing at least a part of the substrate; and a control section that controls the transport mechanism such that the transport carrier holding the substrate is loaded on the plasma processing stage to satisfy a predetermined positional relationship between the window section and the substrate based on information of the position of the substrate with respect to the frame measured by the position measuring section.