发明名称 POLISHING FEATURES FORMED IN COMPONENTS
摘要 A polishing system and method for polishing a channel formed within a component is disclosed. The polishing system may include a tooling element operable to be positioned within a recess formed partially through a component. The tooling element may include an outer surface having a geometry corresponding to a geometry of the recess formed in the component. The tooling element forms a channel between the recess of the component and the tooling element when positioned in the recess. The system may also include a first member in fluid communication with a first opening of the channel, and a second member in fluid communication with a second opening of the channel. The second opening may be in fluid communication with the first opening via the channel. Additionally, the first and second member may be configured to continuously vary a pressure within the channel to move an abrasive slurry within the channel.
申请公布号 US2016059383(A1) 申请公布日期 2016.03.03
申请号 US201514842962 申请日期 2015.09.02
申请人 Apple Inc. 发明人 Chinnakaruppan Palaniappan;Kamireddi Srikanth
分类号 B24C1/08 主分类号 B24C1/08
代理机构 代理人
主权项 1. A polishing system comprising: a tooling element operable to be positioned at least partly within a recess of a component and comprising an outer surface having a geometry corresponding to a geometry of the recess, the tooling element defining a channel within the recess; a first member in fluid communication with a first opening of the channel; and a second member in fluid communication with a second opening of the channel; wherein the second opening is in fluid communication with the first opening via the channel; and the first member and the second member are configured to continuously vary a pressure within the channel to move an abrasive slurry positioned within at least a portion of the channel.
地址 Cupertino CA US