发明名称 METHOD FOR MANUFACTURING LIGHT EMITTING DIODE PACKAGE
摘要 A method for manufacturing a light emitting diode (LED) package, the method includes providing an LED chip and forming electrodes on a top surface of the LED chip; forming a first electric insulation layer on the top surface of the LED chip, the first electric insulation layer adapted to enclose the electrodes therein; etching the first electric insulation layer to define a plurality of second through holes; forming a substrate on a top surface of the first electric insulation layer, the substrate adapted to fill in the plurality of second through holes, the substrate directly contacting the electrodes; dividing the substrate into a plurality of spaced heat dissipation parts; and forming a packaging layer on a bottom surface of the substrate, the packaging layer adapted to enclose the LED chip therein.
申请公布号 US2016064595(A1) 申请公布日期 2016.03.03
申请号 US201514695365 申请日期 2015.04.24
申请人 ADVANCED OPTOELECTRONIC TECHNOLOGY, INC. 发明人 HUANG CHIEN-SHIANG;HUNG TZU-CHIEN
分类号 H01L33/00 主分类号 H01L33/00
代理机构 代理人
主权项 1. A method for manufacturing a light emitting diode (LED) package, the method comprising: providing an LED chip and forming electrodes on a top surface of the LED chip; forming a first electric insulation layer on the top surface of the LED chip, the first electric insulation layer adapted to enclose the electrodes therein; etching the first electric insulation layer to define a plurality of second through holes forming a substrate on a top surface of the first electric insulation layer, the substrate adapted to fill in the plurality of second through holes, the substrate directly contacting the electrodes; dividing the substrate into a plurality of spaced heat dissipation parts; and forming a packaging layer on a bottom surface of the substrate, the packaging layer adapted to enclose the LED chip therein; wherein the step of etching the first electric insulation layer to define a plurality of second through holes is carried out by following steps: forming a second photoresist layer on a top surface of the first electric insulation layer;etching a part of the second photoresist layer and the first electric insulation layer to expose the electrodes, and two second through holes defined in the first electric insulation layer; andremoving the second photoresist layer.
地址 Hsinchu Hsien TW