发明名称 |
METHOD FOR MANUFACTURING LIGHT EMITTING DIODE PACKAGE |
摘要 |
A method for manufacturing a light emitting diode (LED) package, the method includes providing an LED chip and forming electrodes on a top surface of the LED chip; forming a first electric insulation layer on the top surface of the LED chip, the first electric insulation layer adapted to enclose the electrodes therein; etching the first electric insulation layer to define a plurality of second through holes; forming a substrate on a top surface of the first electric insulation layer, the substrate adapted to fill in the plurality of second through holes, the substrate directly contacting the electrodes; dividing the substrate into a plurality of spaced heat dissipation parts; and forming a packaging layer on a bottom surface of the substrate, the packaging layer adapted to enclose the LED chip therein. |
申请公布号 |
US2016064595(A1) |
申请公布日期 |
2016.03.03 |
申请号 |
US201514695365 |
申请日期 |
2015.04.24 |
申请人 |
ADVANCED OPTOELECTRONIC TECHNOLOGY, INC. |
发明人 |
HUANG CHIEN-SHIANG;HUNG TZU-CHIEN |
分类号 |
H01L33/00 |
主分类号 |
H01L33/00 |
代理机构 |
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代理人 |
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主权项 |
1. A method for manufacturing a light emitting diode (LED) package, the method comprising:
providing an LED chip and forming electrodes on a top surface of the LED chip; forming a first electric insulation layer on the top surface of the LED chip, the first electric insulation layer adapted to enclose the electrodes therein; etching the first electric insulation layer to define a plurality of second through holes forming a substrate on a top surface of the first electric insulation layer, the substrate adapted to fill in the plurality of second through holes, the substrate directly contacting the electrodes; dividing the substrate into a plurality of spaced heat dissipation parts; and forming a packaging layer on a bottom surface of the substrate, the packaging layer adapted to enclose the LED chip therein; wherein the step of etching the first electric insulation layer to define a plurality of second through holes is carried out by following steps:
forming a second photoresist layer on a top surface of the first electric insulation layer;etching a part of the second photoresist layer and the first electric insulation layer to expose the electrodes, and two second through holes defined in the first electric insulation layer; andremoving the second photoresist layer. |
地址 |
Hsinchu Hsien TW |