STRIPPER COMPOSITION FOR REMOVING PHOTORESIST AND STRIPPING METHOD OF PHOTORESIST USING THE SAME

摘要

The present invention relates to a stripper composition for removing photoresist and a method for stripping the photoresist using the same. According to the present invention, the stripper composition comprises: a chain amine compound with the weight-average molecular weight of greater than or equal to 95 g/mol; a chain amine compound with the weight-average molecular weight of greater than or equal to 90 g/mol; a cyclic amine compound; an amide-based compound in which a linear of branched alkyl group with 1-5 carbon atoms is mono- or di-substituted on nitrogen; and a polar organic solvent, wherein the weight ratio of the chain amine compound with the weight-average molecular weight of greater than or equal to 95 g/mol and the chain amine compound with the weight-average molecular weight of greater than or equal to 90 g/mol is 1:1 to 1:10. According to the present invention, the stripper composition exhibits excellent peeling and rinsing strength while not containing a toxic solvent.