发明名称 COMPOSITION FOR FORMING PASSIVATION LAYER, SEMICONDUCTOR SUBSTRATE HAVING PASSIVATION LAYER, PRODUCTION METHOD FOR SEMICONDUCTOR SUBSTRATE HAVING PASSIVATION LAYER, SOLAR CELL ELEMENT, PRODUCTION METHOD FOR SOLAR CELL ELEMENT, AND SOLAR CELL
摘要 A composition for forming a passivation layer, including a resin and a compound represented by Formula (I): M(OR 1 ) m . In Formula (I), M includes at least one metal element selected from the group consisting of Nb, Ta, V, Y and Hf, each R 1 independently represents an alkyl group having from 1 to 8 carbon atoms or an aryl group having from 6 to 14 carbon atoms, and m represents an integer from 1 to 5.
申请公布号 EP2876670(A4) 申请公布日期 2016.03.02
申请号 EP20130819813 申请日期 2013.07.19
申请人 HITACHI CHEMICAL COMPANY, LTD. 发明人 TANAKA, TOORU;YOSHIDA, MASATO;NOJIRI, TAKESHI;KURATA, YASUSHI;ORITA, AKIHIRO;ADACHI, SHUICHIRO;HAYASAKA, TSUYOSHI;HATTORI, TAKASHI;MATSUMURA, MIEKO;WATANABE, KEIJI;MORISHITA, MASATOSHI;HAMAMURA, HIROTAKA
分类号 H01L31/0216 主分类号 H01L31/0216
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