发明名称 金属ランタンスパッタリングターゲット
摘要 A method of storing a metal lanthanum sputtering target, wherein a surface of a metal lanthanum target to be stored is processed so as to achieve a roughness Ra of 1 µm or less, a lanthanum fluoride coating is formed on the surface thereof, the metal lanthanum target to which the lanthanum fluoride coating was formed is subsequently charged in a vacuum pack with an oxygen transmission rate of 0.1 cm 3 /m 2 per 24 h at 1 atm or less and a moisture vapor transmission rate of 0.1 g/m 2 per 24 h or less, and the vacuum pack is thereafter subject to vacuum suction and sealing for storage. This invention aims to provide technology for enabling the long-term storage of a sputtering target in a usable state by devising the method of storing a metal lanthanum target as a rare earth metal, and thereby inhibiting the degradation phenomenon caused by the oxidation of the target due to residual air or the inclusion of air.
申请公布号 JP5876097(B2) 申请公布日期 2016.03.02
申请号 JP20140071999 申请日期 2014.03.31
申请人 JX金属株式会社 发明人 成田 里安;佐藤 和幸;小井土 由将
分类号 C23C14/34;B65D81/20;B65D81/24;C23C14/08 主分类号 C23C14/34
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