| 摘要 |
A sintered-object sputtering target comprising an alloy that has a composition which contains 5-60 mol% Pt, with the remainder comprising Fe, and nonmagnetic materials dispersed in the alloy, the sputtering target being characterized in that the nonmagnetic materials include at least C in an amount of 5-60 mol% and that the C grains present in a cross-section perpendicular to the sputtering surface of the target have an average grain area of 50 μm2 or greater. The sputtering target enables the magnetic thin film of heat-assisted magnetic recording media to be produced without requiring the use of an expensive, simultaneously sputtering device, and is reduced in particle generation during sputtering. |
