发明名称 Structure and method for forming integral nitride light sensors on silicon substrates
摘要 A semiconductor integrated circuit has one or more integral nitride-type sensors. In one embodiment, an integral nitride-type sensor and a coplanar supplemental circuit are formed from a common silicon substrate base. In another embodiment, an integral nitride-type sensor and a supplemental circuit are integrated in a vertical orientation.
申请公布号 US9275981(B2) 申请公布日期 2016.03.01
申请号 US201414551427 申请日期 2014.11.24
申请人 RoseStreet Labs, LLC 发明人 Forcier Robert
分类号 H01L31/00;H01L25/16;H01L31/02;H01L31/0304;H01L31/18 主分类号 H01L31/00
代理机构 Greenberg Traurig, LLP 代理人 Greenberg Traurig, LLP
主权项 1. An apparatus, comprising: a first semiconductor substrate comprising a nitride sensor formed on a surface thereof and comprising a plurality of through vias; and a second semiconductor substrate comprising semiconductor devices formed on a surface thereof, wherein each of the through vias connects a metal layer or contact of one of the semiconductor devices to a metal contact of the nitride sensor.
地址 Phoenix AZ US