| 摘要 |
An active matrix substrate includes: a insulating substrate; a pixel including a memory formed from a plurality of active elements on the insulating substrate; an interlayer insulating film formed on the insulating substrate and the plurality of active elements; and a reflective electrode on the interlayer insulating film, wherein, when light is entered from a direction of -30° to a normal line of the active matrix substrate and intensity of a reflected light thereof is measured, the following expression is satisfied: 0.02 < I(35°) / I(30°) < 0.1, where I(¸°) represents intensity of the reflected light measured in a direction of ¸ degree(s) to the normal line of the active matrix substrate. |
