Method for generating extreme ultraviolet light and device for generating extreme ultraviolet light

摘要

An extreme ultraviolet light generation device may comprise: a chamber provided with a through-hole; an introduction optical system configured to introduce the pulse laser beam into a first predetermined region inside the chamber through the through-hole; a target supply device configured to output the target toward the first predetermined region; a light source configured to irradiate a second predetermined region with light whose optical path in the second predetermined region has a transverse section that is longer along a direction perpendicular to a direction of movement of the target than along the direction of movement of the target, the second predetermined region including part of a trajectory of the target between the target supply device and the first predetermined region; and an optical sensor configured to detect light incident on the optical sensor from the second predetermined region to detect the target passing through the second predetermined region.

主权项

1. An extreme ultraviolet light generation method for generating extreme ultraviolet light, comprising:
outputting a target from a target supply device toward a first predetermined region inside a chamber, the chamber being provided with a through-hole; detecting the target passing through a second predetermined region by irradiating the second predetermined region with light and by detecting light incident on an optical sensor from the second predetermined region, the second predetermined region including part of a trajectory of the target between the target supply device and the first predetermined region, and the second predetermined region being a region that is longer along a direction perpendicular to a direction of movement of the target and perpendicular to an optical path of the light with which the second predetermined region is irradiated than along the direction of movement of the target; and irradiating the target with a pulse laser beam introduced into the first predetermined region through the through-hole, on a basis of a timing of detecting the target passing through the second predetermined region, to turn the target into plasma.