发明名称 Mechanisms for controlling gas flow in enclosure
摘要 Embodiments of mechanisms for controlling a gas flow in an interface module are provided. A method for controlling a gas flow in an enclosure includes providing the enclosure which is capable of containing a substrate. The method also includes providing a gas into the enclosure. The method further includes cleaning the gas. In addition, the method includes actuating the gas to generate the gas flow, and the gas flow passes through the substrate when the substrate is located in the enclosure.
申请公布号 US9272315(B2) 申请公布日期 2016.03.01
申请号 US201314051532 申请日期 2013.10.11
申请人 TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD 发明人 Chou You-Hua;Chuang Kuo-Sheng;Lin Yii-Cheng
分类号 B08B17/00;B01D46/44;F24F3/16;H01L21/67 主分类号 B08B17/00
代理机构 McClure, Qualey & Rodack, LLP 代理人 McClure, Qualey & Rodack, LLP
主权项 1. An interface module for transferring at least one substrate, comprising: a housing comprising an upper wall, a lower wall opposite to the upper wall, and a side wall connected between the upper wall and the lower wall, wherein an interior environment of the housing is sealed as the substrate is transferred by the interface module; a load port configured to support a carrier used for transporting the substrate, wherein a first door is arranged corresponding to the load port and positioned on the side wall; a load lock module configured to adjusting an atmosphere, wherein a second door is arranged corresponding to the load lock module and positioned on the side wall; a gas inlet positioned on the upper wall of the housing; and a gas outlet positioned on the lower wall of the housing, wherein a gas flow is driven to flow from the gas inlet to the gas outlet to pass through the substrate in the sealed interior environment, and the moisture and oxygen levels in the sealed interior environment are controlled to parts per million (ppm) levels; a gas supplier positioned on the lower wall, wherein the gas supplier facilitates the discharge of gas into the sealed interior environment; and a gas exhauster positioned on the lower wall, wherein the gas exhauster facilitates the removal of the gas in the sealed interior environment.
地址 Hsin-Chu TW