发明名称 Structured depilatory compositions
摘要 Provided are compositions comprising a depilatory active; and a surfactant, wherein the composition has a Yield Stress of from about 1 Pascal (Pa) to about 1500 Pa, and methods of use thereof.
申请公布号 US9271913(B2) 申请公布日期 2016.03.01
申请号 US201314136460 申请日期 2013.12.20
申请人 Johnson & Johnson Consumer Inc. 发明人 Gunn Euen T.;Tyerech Michael R.
分类号 A61Q9/04;A61K8/34;A61K8/36;A61K8/46;A61K8/42;A61K8/44 主分类号 A61Q9/04
代理机构 代理人
主权项 1. A composition comprising: a depilatory active; and about 2 to about 30% by weight of an anionic surfactant which may be branched or unbranched and is selected from the group consisting of alkyl olefin sulfonates, alkyl sulfates, alkyl ether sulfates, alkyl monoglyceryl ether sulfates, alkyl sulfonates, alkylaryl sulfonates, alkyl sulfosuccinates, alkyl ether sulfosuccinates, alkyl sulfosuccinamates, alkyl amidosulfosuccinates, alkyl carboxylates, alkyl amidoethercarboxylates, alkyl succinates, fatty acyl sarcosinates, fatty acyl amino acids, fatty acyl taurates, fatty alkyl sulfoacetates, alkyl phosphates, and mixtures of two or more thereof; and about 0.1 to about 10% by weight of a structuring aid selected from the group consisting of C11-C15 linear branched fatty acids or fatty alcohols, wherein the composition has an H-B dimension of less than about 1.7 and a pH of from about 7.5 to about 13 and further wherein the composition is substantially free of surfactants comprising one or more amide functional groups.
地址 Skillman NJ US