| 摘要 |
Disclosed is an observation and photography apparatus to which a polishing mechanism (20) is attached. The polishing mechanism (20) is provided with: a turntable (24) with a perpendicular rotation shaft (23); a polishing cloth (26, 27) for polishing the surface of a sample (15) attached to the bottom surface of the turntable (24), and a polishing-fluid spraying nozzle (31, 33) disposed below the polishing cloth (26, 27) for spraying polishing fluid containing polishing material upward to we the polishing cloth (26, 27). |
