发明名称 Semiconductor light emitting device and fabrication method of the semiconductor light emitting device
摘要 A semiconductor light emitting device which can control of current density and can optimize current density and in which a rise in luminosity is possible, and a fabrication method of the semiconductor light emitting device are provided. The semiconductor light emitting device including: a semiconductor substrate structure including a semiconductor substrate, a first metal layer placed on a first surface of the semiconductor substrate, and a second metal layer placed on a second surface of the semiconductor substrate; and a light emitting diode structure including a third metal layer placed on the semiconductor substrate structure, a current control layer placed on the third metal layer and composed of a transparent insulating film and a current control electrode, an epitaxial growth layer placed on the current control layer, and a surface electrode placed on the epitaxial growth layer, wherein the semiconductor substrate structure and the light emitting diode structure are bonded by using the first metal layer and the third metal layer.
申请公布号 US9276174(B2) 申请公布日期 2016.03.01
申请号 US201414340966 申请日期 2014.07.25
申请人 ROHM CO., LTD. 发明人 Takao Masakazu;Senda Kazuhiko
分类号 H01L33/38;H01L33/00;H01L33/46;H01L33/30;H01L33/40 主分类号 H01L33/38
代理机构 Rabin & Berdo, P.C. 代理人 Rabin & Berdo, P.C.
主权项 1. A semiconductor light emitting device comprising: a conductive substrate structure comprising a conductive substrate,a first metal layer disposed on a first surface of the conductive substrate, anda second metal layer disposed on a second surface of the conductive substrate; and a light emitting diode structure disposed on the conductive substrate structure, the light emitting diode structure comprising a third metal layer,a current control layer disposed on the third metal layer, the current control layer composed of a transparent insulating film and a plurality of current control electrodes, the plurality of the current control electrodes being respectively formed in a plurality of through-holes, the plurality of the through-holes respectively being formed so as to pass through the transparent insulating film,an epitaxial growth layer disposed on the current control layer, the epitaxial growth layer including a rectangular planar pattern, anda surface electrode disposed on the epitaxial growth layer, the surface electrode including a wire bonding electrode and peripheral electrodes connected to the wire bonding electrode, the peripheral electrodes being disposed at four corners of the rectangular planar pattern, each of the peripheral electrodes having an opening, wherein the conductive substrate structure and the light emitting diode structure are coupled to each other by bonding between the first metal layer and the third metal layer, wherein the plurality of the current control electrodes are distributed so that a density of the current control electrodes is high in a region not overlapping the wire bonding electrode when viewed from a laminating direction of the epitaxial growth layer, and the density of the current control electrodes is low in a region overlapping the wire bonding electrode when viewed from the laminating direction of the epitaxial growth layer.
地址 Kyoto-Fu JP