| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for producing a single-layer carbon nanotube capable of selectively and precisely controlling chirality. <P>SOLUTION: The production method simultaneously performs a growing step to grow the single-layer carbon nanotube by a plasma CVD process on a catalyst layer of a substrate having the catalyst layer composed of a non-magnetic metal, and an etching step to etch the substrate by reactive ion etching. In the growing step, a hydrocarbon gas is used as the raw material gas of the plasma CVD process to control the plasma sheath electric field generated by the plasma CVD process. In the etching step, the chemical active species in the reactive ion etching is a hydrogen radical and the species carrying physical action is an ion, and the radical density and ion injection energy are controlled in the etching process. <P>COPYRIGHT: (C)2013,JPO&INPIT |
