发明名称 窒化物単結晶のアニール処理方法
摘要 <P>PROBLEM TO BE SOLVED: To provide a method for easily producing a low-resistance nitride single crystal which is high in mobility even when crystal-growth is performed by an ammonothermal method. <P>SOLUTION: A crystal-grown nitride single crystal in the presence of a solvent containing nitrogen in a supercritical state and/or subcritical state is subjected to annealing treatment at 750&deg;C or higher for 5.5 hours or longer. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP5870887(B2) 申请公布日期 2016.03.01
申请号 JP20120218275 申请日期 2012.09.28
申请人 三菱化学株式会社 发明人 藤澤 英夫;三川 豊;鎌田 和典;川端 紳一郎;長岡 裕文;小島 厚彦
分类号 C30B29/38;C30B33/02 主分类号 C30B29/38
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