发明名称 | 窒化物単結晶のアニール処理方法 | ||
摘要 | <P>PROBLEM TO BE SOLVED: To provide a method for easily producing a low-resistance nitride single crystal which is high in mobility even when crystal-growth is performed by an ammonothermal method. <P>SOLUTION: A crystal-grown nitride single crystal in the presence of a solvent containing nitrogen in a supercritical state and/or subcritical state is subjected to annealing treatment at 750°C or higher for 5.5 hours or longer. <P>COPYRIGHT: (C)2013,JPO&INPIT | ||
申请公布号 | JP5870887(B2) | 申请公布日期 | 2016.03.01 |
申请号 | JP20120218275 | 申请日期 | 2012.09.28 |
申请人 | 三菱化学株式会社 | 发明人 | 藤澤 英夫;三川 豊;鎌田 和典;川端 紳一郎;長岡 裕文;小島 厚彦 |
分类号 | C30B29/38;C30B33/02 | 主分类号 | C30B29/38 |
代理机构 | 代理人 | ||
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