SUBSTRATE SUPPORTING APPARATUS AND SUBSTRATE TREATMENT APPARATUS USING IT

摘要

The present invention relates to a substrate supporting apparatus which supports a bottom of the substrate in a chamber and a substrate treatment apparatus using the same to treat the substrate. The substrate supporting apparatus comprises: a supporting bar which is installed in a chamber in a horizontal direction and supports a substrate; a sliding member which is coupled to opposite ends of the supporting bar; and a guide member which is provided in the chamber to restrict rotation of the supporting bar and has a guide wall supporting the sliding member. Thereby, the present invention can support the substrate at a certain position by preventing the rotation of the supporting bar, and prevents separation of the supporting bar by adding more separation preventing pins, wherein a guide member has a clearance in lengthwise direction of the supporting bar and forms a fixed hole as a long hole such that the invention can respond to a deformation of the supporting bar in a lengthwise direction.