RECTANGULAR SUBSTRATE FOR IMPRINT LITHOGRAPHY AND MAKING METHOD

摘要

Provided is a method for producing a square-shaped substrate for imprint lithography. In terms of a lateral side of the square-shaped substrate for imprint lithography processed by polishing the lateral side of the substrate, the lateral side of the square-shaped substrate is polished by translocating the square-shaped substrate and a rotation polishing pad relatively in parallel with respect to the lateral side while pressurizing the rotation polishing pad with a specific pressure in a vertical direction. According to the present invention, it is possible to control a pattern shape and pressurization in a high definition when performing imprint lithography. In addition, transcription of complicated patterns with the high definition.