METHOD AND DEVICE FOR TREATING A SUBSTRATE SURFACE
摘要
A method for treatment of a substrate surface of a substrate by applying a liquid to the substrate surface, the liquid which has been applied to the substrate surface being heated by a heating area which is located above the substrate surface, wherein the temperature of the liquid is kept constant by moving the heating area up and down. Furthermore the invention relates to a corresponding device.
申请公布号
SG11201510784R(A)
申请公布日期
2016.02.26
申请号
SG11201510784R
申请日期
2013.07.04
申请人
EV GROUP E. THALLNER GMBH
发明人
SCHMIDBAUER, MARTIN;ZENGER, TOBIAS;SCHMID, FLORIAN;WIESER, THOMAS;STELZHAMMER, HERMANN;TRACKSDORF, MARTIN