| 摘要 |
The present invention is to accurately adjust a vaporization flow rate of a raw material included in a raw gas in supplying the raw gas including gas obtained by vaporizing a raw material which is solid or liquid. As a resolution means, carrier gas is supplied to a raw material container (3) accommodating a raw material, raw gas including a vaporized raw material is discontinuously supplied to a film forming processing unit (2) with dilution gas. A flow rate (M1) of the raw gas is measured by a mass flow meter (7), and a vaporization amount (A) of the raw material is acquired by subtracting an integral value obtained by integrating a flow rate measurement value (C1) of the carrier gas flowing in the mass flow meter (7), from an integral value obtained by integrating the flow rate measurement value in a supply period of the raw gas. A deviation value between the acquired vaporization amount (A) and a set value of the vaporization amount (A) of the raw material is acquired, and the deviation value is added as a correction value to the flow rate set value (C1) of the carrier gas to maintain the vaporization amount (A) of the raw material to the set value. In addition, the deviation value is subtracted from the flow rate set value (C2) of the dilution gas to regulate a total flow rate of the carrier gas and the dilution gas. |
