GAS SUPPLY SYSTEM, PLASMA PROCESSING DEVICE AND METHOD FOR OPERATING PLASMA PROCESSING DEVICE

摘要

A gas supply system of one embodiment of the present invention is provided with first through third mechanisms. A plurality of integration units of the first mechanism are configured so as to select a gas from one or more gas sources and output the selected gas. The second mechanism is configured so as to distribute a plurality of gases from the plurality of integration units and adjust the flow rate of the distributed gases and output the same. The third mechanism is configured so as to exhaust the gas within the gas supply system to an exhaust device.