发明名称 LASER MACHINING DEVICE AND LASER MACHINING METHOD
摘要 The laser processing device comprises a laser light source emitting a laser light, a converging optical system converging the laser light at an object to be processed, and an aberration providing part for imparting an aberration to the laser light converged at the object by the converging optical system. In an optical axis direction of the laser light, letting a reference aberration range be a range of a converging-induced aberration as an aberration occurring at a position where the laser light is converged as a result of converging the laser light at the object, the aberration providing part imparts a first aberration to the laser light such that the laser light has an elongated range longer than the reference aberration range in the optical axis direction as an aberration range and an intensity distribution in the optical axis direction with a continuous undulation in the elongated range.
申请公布号 US2016052084(A1) 申请公布日期 2016.02.25
申请号 US201414778621 申请日期 2014.03.13
申请人 HAMAMATSU PHOTONICS K.K. 发明人 KAWAGUCHI Daisuke;NAKANO Makoto;SUGIO Ryota;HIROSE Tsubasa;ARAKI Keisuke
分类号 B23K26/00;B23K26/06;B23K26/53;B23K26/064 主分类号 B23K26/00
代理机构 代理人
主权项 1. A laser processing device for forming a modified region in an object to be processed by converging laser light at the object, the laser processing device comprising: a laser light source emitting the laser light; a converging optical system converging the laser light emitted from the laser light source at the object; and an aberration providing part imparting an aberration to the laser light converged at the object by the converging optical system; wherein, in an optical axis direction of the laser light, letting a reference aberration range be a range of a converging-induced aberration as an aberration occurring at a position where the laser light is converged as a result of converging the laser light at the object, the aberration providing part imparts a first aberration to the laser light such that the laser light has an elongated range longer than the reference aberration range in the optical axis direction as an aberration range and an intensity distribution in the optical axis direction with a continuous undulation in the elongated range.
地址 Shizuoka JP