发明名称 STRUCTURE EQUIPPED WITH AMORPHOUS CARBON FILM HAVING ELECTRICALLY CONDUCTIVE PART AND CONTAINING SILICON, AND METHOD FOR MANUFACTURING SAME
摘要 In a structure according to an embodiment, an electrically conductive part on an amorphous carbon film can be appropriately formed, and the region surrounding the electrically conductive part of the amorphous carbon film can have increased friction resistance and wear resistance. The structure includes a substrate and an amorphous carbon film containing Si formed on the substrate and irradiated with a laser beam to have an electrically conductive part modified to have electric conductivity.
申请公布号 US2016056455(A1) 申请公布日期 2016.02.25
申请号 US201414779152 申请日期 2014.03.31
申请人 TAIYO CHEMICAL TECHNOLOGY CO., LTD. 发明人 Shibusawa Kunihiko
分类号 H01M4/36;H01M4/134;H01M4/1395;H01M4/587;H01M4/1393;H01M4/133;H01M4/38 主分类号 H01M4/36
代理机构 代理人
主权项 1. A structure comprising: a substrate; and an amorphous carbon film containing Si formed on the substrate and having at least partially an electrically conductive part modified to have electric conductivity by heating.
地址 Takasaki-shi, Gunma JP