| 发明名称 |
TECHNIQUES FOR FABRICATING DIAMOND NANOSTRUCTURES |
| 摘要 |
Techniques for fabricating diamond nanostructures including application of a self-assembled hard mask to a surface of a diamond substrate to define a pattern of masked regions having a predetermined diameter surrounded by an exposed portion. The exposed portion can be vertically etched to a predetermined depth using inductively coupled plasma to form a plurality of nanoposts corresponding to the masked regions. The nanoposts can be harvested to obtain a nanostructure with a diameter corresponding to the predetermined diameter and a length corresponding to the predetermined depth. |
| 申请公布号 |
US2016052789(A1) |
申请公布日期 |
2016.02.25 |
| 申请号 |
US201514841922 |
申请日期 |
2015.09.01 |
| 申请人 |
THE TRUSTEES OF COLUMBIA UNIVERSITY IN THE CITY OF NEW YORK |
发明人 |
Gaathon Ophir;Englund Dirk R.;Hodges Jonathan;Li Luozhou;Trushem Matthew |
| 分类号 |
C01B31/06;H01J37/32;C09K11/65 |
主分类号 |
C01B31/06 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A method for fabricating diamond nanostructures, comprising:
applying a hard mask to a surface of a diamond substrate to define thereon a pattern of masked regions having a predetermined diameter surrounded by at least one exposed portion; vertically etching the exposed portion of the diamond structure to at least the predetermined depth to thereby form a plurality of nanoposts corresponding to the masked regions; and harvesting at least one nanopost from the diamond substrate, thereby obtaining a nanostructure having a diameter corresponding to the predetermined diameter, and a length corresponding to the predetermined depth. |
| 地址 |
New York NY US |
