FILM-FORMING AND ANALYSIS COMPOSITE APPARATUS, METHOD FOR CONTROLLING FILM-FORMING AND ANALYSIS COMPOSITE APPARATUS, AND VACUUM CHAMBER

摘要

A vacuum chamber is provided with a film-forming apparatus which film-forms an oxide semiconductor thin film by sputtering, an analysis apparatus which performs spectroscopic analysis with respect to a surface of the film-formed oxide semiconductor thin film, and a valve which splits an inner space of the vacuum chamber into a first space where the analysis apparatus is arranged and a second space where the film-forming apparatus is arranged and permits communication between the split first space and second space.

主权项

1. A film-forming and analysis composite apparatus having a function as a vacuum chamber which can make an inner space thereof a vacuum, the apparatus comprising:
a film-forming apparatus which film-forms a sample by sputtering; an analysis apparatus which performs spectroscopic analysis with respect to a surface of the sample which is film-formed; and an interrupting member which splits the inner space into a first space where the analysis apparatus is arranged and a second space where the film-forming apparatus is arranged and permits communication between the split first space and second space.