发明名称 System and Method for Apodization in a Semiconductor Device Inspection System
摘要 An inspection system with selectable apodization includes a selectably configurable apodization device disposed along an optical pathway of an optical system. The apodization device includes one or more apodization elements operatively coupled to one or more actuation stages. The one or more actuation stages are configured to selectably actuate the one or more apodization elements along one or more directions. The inspection system includes a control system communicatively coupled to the one or more actuation stages. The control system is configured to selectably control an actuation state of at the one or more apodization elements so as to apply a selected apodization profile formed with the one or more apodization elements.
申请公布号 US2016054232(A1) 申请公布日期 2016.02.25
申请号 US201514930254 申请日期 2015.11.02
申请人 KLA-Tencor Corporation 发明人 Sullivan Jamie M.;Janik Gary;Cui Steve;Runyon Rex;Wilk Dieter;Short Steve;Haurylau Mikhail;Zhang Qiang Q.;Chen Grace Hsiu-Ling;Danen Robert M.;Martono Suwipin;Verma Shobhit;Cai Wenjian;Brender Meier
分类号 G01N21/88;G01N21/95 主分类号 G01N21/88
代理机构 代理人
主权项 1. An inspection system with selectable apodization, comprising: an illumination source configured to illuminate a surface of a sample disposed on a sample stage; a detector configured to detect at least a portion of light emanating from the surface of the sample, the illumination source and the detector being optically coupled via an optical pathway of an optical system including an illumination arm and a collection arm; and a selectably configurable apodization device disposed along the optical pathway of the optical system, wherein the apodization device includes one or more apodization elements operatively coupled to one or more actuation stages, the one or more actuation stages configured to selectably actuate the one or more apodization elements along one or more directions in order to apply a selected apodization profile.
地址 Milpitas CA US