| 摘要 |
PROBLEM TO BE SOLVED: To provide a self-crosslinking composition suitable for underlayer applications that do not have components that out-gas or sublime in semiconductor manufacturing.SOLUTION: A self-crosslinking composition comprises a polymer comprising at least one repeating unit represented by formula (1), and an organic solvent (where Ar1-Ar4 independently represent a substituted/unsubstituted divalent aryl group; A is a chemical bond, O, -C(O) O-, -C(O) NR-, or a C1-60 divalent hydrocarbyl group; Z is H, a substituted/unsubstituted C1-30 alkyl group, a substituted/unsubstituted C2-30 alkenyl group, a substituted/unsubstituted C2-30 alkynyl group, a substituted/unsubstituted C7-30 aralkyl group or a substituted/unsubstituted C6-20 aryl group; R is H or a C1-30 hydrocarbyl group; m is 0 or 1).SELECTED DRAWING: None |
