| 发明名称 |
SALT, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN |
| 摘要 |
A salt represented by the formula (I);;;wherein Q1 and Q2 each independently represent a fluorine atom or a C1 to C6 perfluoroalkyl group, Lb1 represents a single bond or a divalent C1 to C24 saturated hydrocarbon groupwhere a methylene group may be replaced by an oxygen atom or a carbonyl group and where a hydrogen atom may be replaced by a hydroxyl group or a fluorine atom, and Y represents a hydrogen atom, a fluorine atom, or an optionally substituted C3 to C18 alicyclic hydrocarbon groupwhere a methylene group may be replaced by an oxygen atom, a carbonyl group or a sulfonyl group; and Ar represents a divalent C6 to C20 aromatic hydrocarbon group, and Z+ represents an organic sulfonium cation or an organic iodonium cation. |
| 申请公布号 |
US2016052877(A1) |
申请公布日期 |
2016.02.25 |
| 申请号 |
US201514835470 |
申请日期 |
2015.08.25 |
| 申请人 |
SUMITOMO CHEMICAL COMPANY, LIMITED |
发明人 |
NISHIMURA Takashi;MUKAI Yuko;ICHIKAWA Koji |
| 分类号 |
C07C311/48;G03F7/20;G03F7/38;C08F220/18;G03F7/004;G03F7/039;G03F7/038;G03F7/16;G03F7/32 |
主分类号 |
C07C311/48 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A salt represented by formula (I); wherein Q1 and Q2 each independently represent a fluorine atom or a C1 to C6 perfluoroalkyl group, Lb1 represents a single bond or a divalent C1 to C24 saturated hydrocarbon groupwhere a methylene group may be replaced by an oxygen atom or a carbonyl group and where a hydrogen atom may be replaced by a hydroxyl group or a fluorine atom, and Y represents a hydrogen atom, a fluorine atom, or an optionally substituted C3 to C18 alicyclic hydrocarbon groupwhere a methylene group may be replaced by an oxygen atom, a carbonyl group or a sulfonyl group; and Ar represents a divalent C6 to C20 aromatic hydrocarbon group, and Z+ represents an organic sulfonium cation or an organic iodonium cation. |
| 地址 |
Tokyo JP |
