| 摘要 |
The present invention relates to a precursor supplying device for forming a thin film, a thin film forming device comprising same, and a thin film forming method using same. The precursor supplying device, according to one embodiment of the present invention, comprises: a raw material storage part for storing a liquid raw material; a droplet supply part coupling to the raw material storage part for discharging the liquid raw material in the shape of droplets; and a precursor vaporization part comprising a chamber wall, a droplet inlet, a heating part, a carrier gas inlet, and a precursor outlet, the chamber wall limiting a vaporization space, the droplet inlet being formed on a first side part of the chamber wall for having droplets pass from the droplet supply part to the vaporization space, the heating part being coupled to the vaporization space for vaporizing the droplets in the vaporization space, thereby forming a vapor precursor in the vaporization space, the carrier gas inlet being formed on a second side part of the chamber wall for introducing carrier gas inside the vaporization space, and the precursor outlet being formed on a third side part of the chamber wall for outputting, to a reaction chamber, the vapor precursor mixed with the carrier gas. |
